SMEE's patent filing represents a significant step forward in China's efforts to develop its own EUV lithography tools.

TSMC was ahead of Intel with the adoption of EUV lithography tools for mass production, but when it comes to High-NA EUV ...

According to industry sources, TSMC plans to launch its first high-NA EUV lithography equipment at its fab site in Hsinchu, ...

The patent from Shanghai Micro Electronics Equipment is still under review, but producing EUV tools in China would break a ...

Lasertec, the sole provider of EUV patterned mask inspection systems, aims for double-digit revenue growth despite a slowdown ...

TSMC is expecting to receive its first state-of-the-art High-NA EUV lithography machine from TSMC this month, will begin ...

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How Does EUV Lithography Work? EUV Lithography is a state-of-the-art technology in chip manufacturing that uses highly energetic ultraviolet light to carve detailed patterns onto semiconductor ...

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A newly revealed patent from Chinese lithography systems maker Shanghai Micro Electronics Equipment (SMEE) shows how domestic firms could progress in the local advanced lithography tools market ...